Direct measurement of van der Waals and diffuse double-layer forces between titanium dioxide surfaces produced by atomic layer deposition

Walsh RB;Nelson A;Skinner WM;Parsons D;Craig VSJ

2012-01-01

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Abstract

The van der Waals forces between titanium dioxide surfaces produced by atomic layer deposition (ALD) at the isoelectric point have been measured and found to agree with the calculated interaction using Lifshitz theory. It is shown that under the right conditions very smooth ALD surfaces are produced. At pH values slightly below and above the isoelectric point, a repulsive diffuse double-layer repulsion was observed and is attributed to positive and negative charging of the surfaces, respectively. At high pH, it was found that the forces remained repulsive up until contact and no van der Waals attraction or adhesion was evident. The absence of an attraction cannot be explained by the presence of hydration forces.